InductivelyCoupledPlasma相关论文
The characteristics of an innovative configuration of multiple radiofrequency (RF) coils immersed in a large metallic ch......
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A Study of the Chemical Reaction on the Etched ITO Thin Films Surface Using Inductivity Coupled Plas
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In this study,the internal vacuum camera (IVC) which can be used at low and high vacuum regions was manufactured....
Plasma process has gained widespread use in the manufacture of micro- and nano- electronics technology since it can incr......
Downstream oxygen plasma is no longer applicable in stripping photoresist coated on low-k dielectric layers,where oxygen......
Studies on the Spatial and Temporal Behaviors of the Electron Energy Distribution and Plasma Paramet
Spatial and temporal behaviors of the electron energy distributions (EEDFs) and the plasma parameters were experimentall......
Spatial evolutions of the electron energy distributions in a weakly magnetized solenoidal-type induc
The electron energy distributions (EEDs) were measured in solenoidal-type inductively coupled plasma (ICP) under a weak ......
Study on plasma uniformity by using 2D real time measurement method in Ar/He inductively coupled pla
Recently,measurement method of two dimensional (2D) spatial distribution of plasma parameters based on the floating harm......
Sharing one ICP source for simultaneous elemental analysis by ICP-MS/OES:some unique instrumental ca
Inductively coupled plasma(ICP)is one of the most popular sources in analytical atomic spectrometers,including inductive......
In general,CF4/Ar/O2 mixture plasma have been wieldy used in semiconductor etching processes.It is required a dedicated ......
An inductively coupled plasma (ICP) system in which a remote ICP (expansion region) with large volume is attached to a m......
Effects of RF bias power on plasma uniformity in a large-area inductively coupled plasma based on fl
Plasma large-area etching technology requires inductively coupled plasma (ICP) reactors to work with a uniform plasma de......
As widely used in the substrate etching,thin film growth,plasma propulsion,materials processing and semiconductor indust......
In this work,we report the parameters in novel plasma source diagnosed by optical emission spectrometry (OES) during a h......
For preparing plasma facing material (PFM) in fusion device,an Ar/H2 inductively coupled plasma torch driven by a 24-60 ......
Nitridation of Ti substrate surface using laterally-long Ar/N2 loop type of inductively coupled ther
The authors have so far developed a loop type of inductively coupled thermal plasma(Ioop-ICTP) for large-area thermal pl......
A unique plasma figuring (PF) process was created and demonstrated at Cranfield University for manufacturing extremely l......
Numerical investigation of radio-frequency negative hydrogen ion sources by a three-dimensional flui
A three-dimensional fluid model is developed to investigate the radio-frequency inductively coupled H2 plasma in a react......
Modeling of an Inductively Coupled Plasma Connected to a Mass Spectrometer,from the Underlying Mecha
A computational model for an inductively coupled plasma connected to a mass spectrometer interface is built to obtai......
An inductively coupled radio frequency ion source has been developed and its extraction characteristics measured.Beam cu......
AIM: Both observational and experimental studies have shown that higher selenium status reduces the risk of upper gastro......
Numerical simulation and experimental validation of multiphysics field coupling mechanisms for a hig
We take the established inductively coupled plasma (ICP) wind tunnel as a research object to investigate the thermal pro......
Time-resolved radial uniformity of pulse-modulated inductively coupled O2/Ar plasma has been investigated by means of a ......
One of the novel phenomena of Ar/O2 inductively coupled plasma,the delta negative ions density profile is discovered by ......
研究了连续氢化物发生－感耦等离子体原子发射光谱法测定饮料中Ａｓ和Ｈｇ的适宜条件，可以用较低的功率（１．１ｋＷ）获得稳定的分析信号，待测元素含量０．０５～０．１ｍｇ／Ｌ时，ＲＳＤ小于......
